Samsung Electronics Plans to Mass Produce 1nm Process by 2030, Deploying High-NA EUV Technology

Samsung Electronics' technology expert Park Chang-min announced at the 2026 NGL conference that the company plans to introduce high-NA EUV lithography technology in its 1nm process, with mass production expected to begin as early as 2030. The company has set the 1nm node as its target for large-scale production, focusing on developing the necessary technology for commercialization. Samsung Electronics is also strengthening its development of high-NA EUV, which is the next generation of EUV technology. According to the roadmap, Samsung Electronics expects to start using high-NA EUV in mass production around 2030. The company has already commercialized its 2nm process and plans to begin mass production of its 1.4nm SF1.4 process in 2029, while preparing to start mass production of SF1.4+ (an enhanced version of the 1.4nm process) and its 1nm process in 2030.

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